Nanospec 210XP (nanospec2)
New Normal Changes
New location! Now in Stinson 104 Exfab, behind Heidelberg MLA150.
The Nanometrics Nanospec 210XP system uses non-contact, spectro-reflectometry (measurement of the intensity of reflective light as a function of incident wavelength) to determine the thickness of transparent films (up to two) on substrates, such as silicon, that are reflective in the visible range.
Capabilities and Specifications
Process Temperature Range:
Manual Film Thickness Measurement. Single or dual layer transparent films > 300 Ã
Lab Facility, Location, and Badger Information
Training and Maintenance
Steps to become a tool user
Read the relevant operating procedures:
Contact a qualified user of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. You may also contact the Discussion Lists
. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool.
Print the SNF Training Shadowing Form
on clean room paper.
Sign up for the relevant training scheduled in