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Flexus 2320 Stress Tester (stresstest)

New Normal Changes

New location! Still in the same room, cleanroom litho area. It has been moved closer to the ASML into the corner where the Singe oven used to be, opposite the YES oven.

Overview

The Flexus 2320 determines wafer curvature by measuring the angle of deflection of a laser beam off the surface of the substrate. Film stress is determined by comparing the change in radius of curvature of the substrate, with and without the film. This means that the substrate and the film must be optically reflective in the wavelength used. Because semi-transparent films may absorb light (depending on the incident wavelength/angle and the film thickness/RI) the Flexus 2320 has two wavelengths (670 nm and 750 nm).

Cleanliness: 

Processing Technique(s)

Capabilities and Specifications

Lab Facility, Location, and Badger Information

Training and Maintenance

Lab Facility: 
Training Charges: 
0.75 hours
Primary Trainer: 
Primary Maintenance: 

Steps to become a tool user

  1. Become a member of SNF.
  1. Sign up for the relevant training scheduled in .
  2. Read the relevant operating procedures:
  3. Shadowing: Contact a qualified user of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. You may also contact the Discussion Lists. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool.
    Print the SNF Training Shadowing Form on clean room paper.
  4. Sign up for the relevant training scheduled in .
  5. Contact the primary trainer: .

Operating Instructions