Flexus 2320 Stress Tester (stresstest)
The Flexus 2320 determines wafer curvature by measuring the angle of deflection of a laser beam off the surface of the substrate. Film stress is determined by comparing the change in radius of curvature of the substrate, with and without the film. This means that the substrate and the film must be optically reflective in the wavelength used. Because semi-transparent films may absorb light (depending on the incident wavelength/angle and the film thickness/RI) the Flexus 2320 has two wavelengths (670 nm and 750 nm).
Capabilities and Specifications
Lab Organization, Location, and Badger Information
SNF: Characterization and Testing
Training and Maintenance
Steps to become a tool user
Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF