AJA Evaporator (aja-evap)
The AJA e-beam evaporator can be used to directionally deposit various metals. Controllably evaporate a variety of materials, with automatic shutter closing at the defined end thickness. Evaporate Ti, SiO2, Al2O3, Au, Fe, Cr, Ni, Ag, Pt, Al, Pd, NiO, Cu, TiO2, Nb2O5, Ge, Hf, et al. Please check the up-to-date list in Badger comments. Evaporate onto pieces, up to 3 4" wafers, or a 6" wafer, which are transferred into the chamber via a load lock.
Capabilities and Specifications
Material Thickness Range: 0.0 - 300.0 nm
Process Temperature Range:
4"x3 or 6"x1 wafers or pieces
For more than 300nm deposition, please contact Graham Ewing<email@example.com> in advance
Lab Facility, Location, and Badger Information
Training and Maintenance
Steps to become a tool user
Read the relevant operating procedures:
Contact a qualified user of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. You may also contact the Discussion Lists
. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You are recommended to shadow qualified users twice to be comfortable with the tool.
Print the SNF Training Shadowing Form
on clean room paper.
two shadowing sessions and a written test before training with tool owner