Sensofar S-neox s-neox |
Sensofar S-neox Training |
All |
SNF Cleanroom Paul G Allen L107 |
non contact 3D optical profiling
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Wet Bench Flexcorr 1 wbflexcorr-1 |
Wet Bench Flexcorr 1and2 and 3and4 Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.
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MRC Reactive Ion Etcher mrc |
MRC Reactive Ion Etcher Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Typically used for sputter etching; Single wafer, direct load system; wafers/ pieces can be directly placed on electrode
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Oven BlueM 200°C to 430°C bluem |
Blue M Oven Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Convection in N2. Cure. Programmable.
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Tencor P2 Profilometer p2 |
Tencor P2 Profilometer Training |
Clean, Semiclean |
SNF Cleanroom Paul G Allen L107 |
Step height measurement range 500 Å to 80 µm
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Heidelberg MLA 150 - 2 heidelberg2 |
Heidelberg Training |
All |
SNF Cleanroom Paul G Allen L107 |
Direct Write
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micromanipulator6000 IV-CV probe station micromanipulator6000 |
micromanipulator6000 IV-CV probe station Training |
All |
SNF Exfab Paul G Allen 151 Ocean |
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Sinton Lifetime Tester sinton-lifetime-tester |
Sinton Lifetime Tester Training |
Flexible |
SNF Exfab Paul G Allen 151 Ocean |
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LEI1500 Contactless Sheet Resistance Mapping eddycurrent |
LEI1500 Contactless Sheet Resistance Mapping Training |
All |
SNF Exfab Paul G Allen 151 Ocean |
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DISCO Wafer Saw DISCO wafersaw |
Wafersaw DISCO training |
Flexible |
SNF Exfab Paul G Allen 159 Capitola |
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Lesker Sputter lesker-sputter |
Sputter Lesker 1&2 Training |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter
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Optomec Printer optomec-printer |
Optomec Printer Training |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
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AJA Evaporator aja-evap |
Evaporator AJA training |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
For more than 300nm deposition, please contact Graham Ewing<grahamj.ewing@stanford.edu> in advance
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First Nano carbon nanotube CVD furnace cvd-nanotube |
cvd-nanotube training |
Flexible |
SNF Exfab Paul G Allen L119 Año Nuevo |
Aligned single-walled carbon nanotube growth with ST-cut quartz substrates (available from SNF stockroom);1-15 single-walled carbon nanotubes per micron density
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Aixtron Black Magic graphene CVD furnace aixtron-graphene |
CVD graphene furnace Aixtron Black Magic training |
Flexible |
SNF Exfab Paul G Allen L119 Año Nuevo |
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Aixtron MOCVD - III-N system aix-ccs |
MOCVD - III-N Aixtron training |
Clean (MOCVD) |
SNF MOCVD Paul G Allen 213XA |
N and P doping available.
For Si clean: SC1, SC2, HF dip.
For Sapphire clean: SC1, SC2.
For GaN template on Si or Sapphire: Piranha, SC1, SC2.
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Aixtron MOCVD - III-V system aix200 |
MOCVD - III-V Aixtron training |
Flexible |
SNF MOCVD Paul G Allen 213XA |
N and P doping available.
For Si clean: SC1, SC2, HF dip.
For III-V clean: HCl or HF dip.
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PDS 2010 LABCOTER™ 2 Parylene Deposition System parcoater |
Parylene Coater Training |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
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Plasmaetch PE-50 plasma-etch |
Plasmaetch PE-50 Training |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Low power, high pressure plasma; low bias, minimal damage. Often used for surface treatment At SNF - nSiL lab
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