Equipment name & NEMO ID | Technique | Cleaning Required | Cleanliness | Primary Materials Etched | Material Thickness Range | Materials Lab Supplied | Resist | Developer | Process Temperature Range | Chemicals | Gases | Sample Size Limits | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Savannah ALD savannah |
Flexible |
1.00 Å -
50.00 nm
|
24 °C - 250 °C
|
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SEM -Zeiss Merlin sem-merlin |
All |
0.00 mm -
35.00 mm
|
6 in wafer |
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Sensofar S-neox s-neox |
All |
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1 | ||||||||||||
SPTS uetch vapor etch uetch |
All |
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1 | ||||||||||||
SVG Develop Track 1 svgdev |
All |
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25 4 inch wafers | ||||||||||||
SVG Develop Track 2 svgdev2 |
All |
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25 4 inch wafers | ||||||||||||
SVG Resist Coat Track 1 svgcoat |
All |
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25 4 inch wafers | ||||||||||||
SVG Resist Coat Track 2 svgcoat2 |
All |
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25 4 inch wafers | ||||||||||||
Tencor P2 Profilometer p2 |
Clean, Semiclean |
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1 | ||||||||||||
Tylan9 Forming Gas Anneal Furnace tylan9 |
Flexible |
250 °C - 1100 °C
|
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50 | |||||||||||
Tystar Bank 1 Tube 1 B1T1 Flexible Oxide |
Flexible |
25.00 Å -
2.00 μm
|
400 °C - 1100 °C
|
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100 | ||||||||||
Tystar Bank 1 Tube 2 B1T2 Flexible Oxide Anneal |
Flexible |
25.00 Å -
2.00 μm
|
400 °C - 1100 °C
|
, , |
100 | ||||||||||
Tystar Bank 2 Tube 5 B2T5 Clean Oxide Anneal |
Pre-Diffusion Clean | Clean |
25.00 Å -
2.00 μm
|
400 °C - 1100 °C
|
, , |
100 | |||||||||
Tystar Bank 2 Tube 6 B2T6 Clean Oxide |
Pre-Diffusion Clean | Clean |
25.00 Å -
2.00 μm
|
400 °C - 1100 °C
|
, , |
100 | |||||||||
Tystar Bank 3 Tube 9 B3T9 Clean Oxide |
Pre-Diffusion Clean | Clean |
25.00 Å -
2.00 μm
|
400 °C - 1100 °C
|
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100 | |||||||||
Wet Bench Clean 1 wbclean-1 |
Clean |
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25 | ||||||||||||
Wet Bench Clean 2 wbclean-2 |
Clean |
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25 | ||||||||||||
Wet Bench Clean_res- hotphos wbclean_res-hotphos |
Clean |
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Wet Bench Clean_res-hf wbclean_res-hf |
Clean |
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Wet Bench Clean_res-piranha wbclean_res-piranha |
Clean |
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