Annealing (furnace)

Furnaces annealing is a heated process performed in an Annealing Furnace to can change material properties of a sample. Anneal parameters include temperature, ramp time, anneal time, ambient gas. Generally anneal times range from 15 minutes to many hours.

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Processing Techniques	Equipment name & Badger ID	Cleanliness	Location
Oxide Growth (furnace), Annealing (furnace)	Thermco1 Oxidation Furnace thermco1	Clean	SNF Cleanroom Paul G Allen L107
Oxide Growth (furnace), Annealing (furnace)	Thermco3 Oxidation Furnace thermco 3	Clean	SNF Cleanroom Paul G Allen L107
Oxide Growth (furnace), Annealing (furnace)	Thermco4 Oxidation Furnace thermco4	Flexible	SNF Cleanroom Paul G Allen L107
Annealing (furnace)	Tylan9 Forming Gas Anneal Furnace tylan9	Flexible	SNF Cleanroom Paul G Allen L107
Annealing (furnace)	Tylanfga Forming Gas Anneal Furnace tylanfga	Semiclean	SNF Cleanroom Paul G Allen L107
Oxide Growth (furnace), Annealing (furnace)	Thermco1 Oxidation Furnace thermco1	Clean	SNF Cleanroom Paul G Allen L107
Oxide Growth (furnace), Annealing (furnace)	Thermco3 Oxidation Furnace thermco 3	Clean	SNF Cleanroom Paul G Allen L107
Oxide Growth (furnace), Annealing (furnace)	Thermco4 Oxidation Furnace thermco4	Flexible	SNF Cleanroom Paul G Allen L107

Detail Tab

Processing Technique	Equipment name & Badger ID	Cleanliness	Materials Lab Supplied	Material Thickness Range	Substrate Size	Maximum Load (number of wafers)	Process Temperature Range	Gases	Cleaning Required	Notes
Oxide Growth (furnace), Annealing (furnace)	Thermco1 Oxidation Furnace thermco1	Clean	SiO₂	25 Å - 2 μm	Pieces 2" 3" 4" 6"	50	700 °C - 1100 °C	H₂ N₂ O₂	Pre-Diffusion Clean	Dry and wet oxidation. Use calculator to determine growth rate. N2 annealing available.
Oxide Growth (furnace), Annealing (furnace)	Thermco3 Oxidation Furnace thermco 3	Clean	SiO₂	25 Å - 2 μm	Pieces 2" 3" 4" 6"	50	700 °C - 1100 °C	H₂ N₂ O₂	Pre-Diffusion Clean	Dry and wet oxidation. Use calculator to determine growth rate. N2 annealing available.
Oxide Growth (furnace), Annealing (furnace)	Thermco4 Oxidation Furnace thermco4	Flexible	SiO₂	25 Å - 2 μm	Pieces 2" 3" 4" 6"	50	700 °C - 1100 °C	H₂ N₂ O₂		Dry and wet oxidation. Use calculator to determine growth rate. N2 annealing available.
Annealing (furnace)	Tylan9 Forming Gas Anneal Furnace tylan9	Flexible	SiO₂		Pieces 2" 3" 4"	50	250 °C - 1100 °C	10% H₂ in N₂ Ar H₂ N₂ O₂		Any material that won't vaporize is okay. N2 and Ar annealing available.
Annealing (furnace)	Tylanfga Forming Gas Anneal Furnace tylanfga	Semiclean		100 Å - 100 Å	Pieces 2" 3" 4"	50	250 °C - 800 °C	10% H₂ in N₂ Ar N₂	Standard Metal Clean	For standard metals deposited in Lesker2, Intlvac Sputter or Intlvac Evaporation only. N2 and Ar annealing available. Please contact staff for more information.
Oxide Growth (furnace), Annealing (furnace)	Thermco1 Oxidation Furnace thermco1	Clean	SiO₂	25 Å - 2 μm	Pieces 2" 3" 4" 6"	50	700 °C - 1100 °C	H₂ N₂ O₂	Pre-Diffusion Clean	Dry and wet oxidation. Use calculator to determine growth rate. N2 annealing available.
Oxide Growth (furnace), Annealing (furnace)	Thermco3 Oxidation Furnace thermco 3	Clean	SiO₂	25 Å - 2 μm	Pieces 2" 3" 4" 6"	50	700 °C - 1100 °C	H₂ N₂ O₂	Pre-Diffusion Clean	Dry and wet oxidation. Use calculator to determine growth rate. N2 annealing available.
Oxide Growth (furnace), Annealing (furnace)	Thermco4 Oxidation Furnace thermco4	Flexible	SiO₂	25 Å - 2 μm	Pieces 2" 3" 4" 6"	50	700 °C - 1100 °C	H₂ N₂ O₂		Dry and wet oxidation. Use calculator to determine growth rate. N2 annealing available.

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Annealing (furnace)

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