The "Clean" cleanliness group is part of the SNF/ExFab contamination policy.
The following is a list of equipment that fall into the "Clean" category.
Equipment name & NEMO ID | Training Required & Charges | Cleanliness | Location | Notes |
---|---|---|---|---|
AMAT P5000 Etcher p5000etch |
Dry Etcher AMAT P5000 Training | Clean, Clean (Ge), Semiclean | SNF Cleanroom Paul G Allen L107 | |
AMAT Centurion Epitaxial System epi2 |
Epitaxial AMAT Centurion Training | Clean | SNF Cleanroom Paul G Allen L107 |
N and P doping available- intrinsic to 5E19 Operating pressure range is 5-300Torr |
AJA2 Evaporator aja2-evap |
Evaporator AJA2 | Semiclean | SNF Cleanroom Paul G Allen L107 |
For more than 300nm deposition, please contact Graham Ewing<grahamj.ewing@stanford.edu> in advance |
Aixtron MOCVD - III-N system aix-ccs |
MOCVD - III-N Aixtron training | Clean (MOCVD) | SNF MOCVD Paul G Allen 213XA |
N and P doping available. |
Equipment name & NEMO ID | Technique | Cleaning Required | Cleanliness | Primary Materials Etched | Other Materials Etched | Material Thickness Range | Materials Lab Supplied | Process Temperature Range | Gases | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|---|---|
AMAT P5000 Etcher p5000etch |
Clean, Clean (Ge), Semiclean | |||||||||||
AMAT Centurion Epitaxial System epi2 |
Pre-Diffusion Clean | Clean |
50.00 Å -
3.00 μm
|
600 °C - 1200 °C
|
1 | |||||||
AJA2 Evaporator aja2-evap |
Semiclean |
0.00 -
300.00 nm
|
, , , , , |
4"x3 or 6"x1 wafers or pieces | ||||||||
Aixtron MOCVD - III-N system aix-ccs |
Clean (MOCVD) |
0.00 -
5.00 μm
|
400 °C - 1300 °C
|
, , , |
4"x1, 2"X3, pieces |