Epi2 epi2 |
SNF Cleanroom Paul G Allen L107 |
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Epi2 is the the first chamber on the tool and... |
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AMAT Centurion Epitaxial Training |
PlasmaTherm Versaline HDP CVD System hdpcvd |
SNF Cleanroom Paul G Allen L107 |
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PlasmaTherm Versaline HDP CVD System Training |
Teos2 teos2 |
SNF Cleanroom Paul G Allen L107 |
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Teos2 furnace allows LPCVD deposition of silicon dioxide, using tetraethyl... |
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Teos Deposition Furnace Training |
ThermcoLTO thermcoLTO |
SNF Cleanroom Paul G Allen L107 |
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Silicon dioxide (SiO2) is deposited at between 300 and 450C... |
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Thermco LTO Deposition Furnace Training |
ThermcoNitride thermconitride1 |
SNF Cleanroom Paul G Allen L107 |
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Silicon nitride (or nitride or Si3N4) is deposited at moderately... |
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Thermco Nitride Deposition Furnace Training |
ThermcoPoly1 thermcopoly1 |
SNF Cleanroom Paul G Allen L107 |
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Polycrystalline silicon (also called "poly-Si" or "poly") is deposited at... |
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Thermco Poly Deposition Furnace Training |
ThermcoPoly2 thermcopoly2 |
SNF Cleanroom Paul G Allen L107 |
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Same as ThermcoPoly1 but in the "flexible (gold-contaminated)" group. ... |
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Thermco Poly Deposition Furnace Training |
TylanBPSG tylanbpsg |
SNF Cleanroom Paul G Allen L107 |
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Silicon dioxide (SiO2) is deposited at between 300 and 450C... |
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TylanBPSG Deposition Furnace Training |