Lesker2 Sputter lesker2-sputter |
Sputter Lesker 1&2 Training |
Semiclean |
SNF Cleanroom Paul G Allen L107 |
reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter
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MVD mvd |
MVD Training |
Flexible |
SNF Cleanroom Paul G Allen L107 |
Reactor located inside glovebox
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Wet Bench Resist Strip wbresstrip-1 |
Wet Bench Resist Strip |
Clean (Ge), Semiclean, Flexible |
SNF Cleanroom Paul G Allen L107 |
Wet Resist Removal: SRS-100 or PRS1000
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Xactix Xenon Difluoride Etcher xactix |
Xactix Xenon Difluoride Etcher Training |
All |
SNF Cleanroom Paul G Allen L107 |
Isotropic Si etching; can be used for backside Si removal on small pieces
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Karl Suss MA-6 Contact Aligner karlsuss |
Contact Aligner Karl Suss MA-6 Training |
All |
SNF Cleanroom Paul G Allen L107 |
1:1 Contact Aligner.
Backside align, including IR.
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AJA2 Evaporator aja2-evap |
Evaporator AJA2 |
Semiclean |
SNF Cleanroom Paul G Allen L107 |
For more than 300nm deposition, please contact Graham Ewing<grahamj.ewing@stanford.edu> in advance
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Sinton Lifetime Tester sinton-lifetime-tester |
Sinton Lifetime Tester Training |
Flexible |
SNF Exfab Paul G Allen 151 Ocean |
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LEI1500 Contactless Sheet Resistance Mapping eddycurrent |
LEI1500 Contactless Sheet Resistance Mapping Training |
All |
SNF Exfab Paul G Allen 151 Ocean |
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micromanipulator6000 IV-CV probe station micromanipulator6000 |
micromanipulator6000 IV-CV probe station Training |
All |
SNF Exfab Paul G Allen 151 Ocean |
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DISCO Wafer Saw DISCO wafersaw |
Wafersaw DISCO training |
Flexible |
SNF Exfab Paul G Allen 159 Capitola |
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Optomec Printer optomec-printer |
Optomec Printer Training |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
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AJA Evaporator aja-evap |
Evaporator AJA training |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
For more than 300nm deposition, please contact Graham Ewing<grahamj.ewing@stanford.edu> in advance
|
Lesker Sputter lesker-sputter |
Sputter Lesker 1&2 Training |
Flexible |
SNF Exfab Paul G Allen 155A Venice |
reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter
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First Nano carbon nanotube CVD furnace cvd-nanotube |
cvd-nanotube training |
Flexible |
SNF Exfab Paul G Allen L119 Año Nuevo |
Aligned single-walled carbon nanotube growth with ST-cut quartz substrates (available from SNF stockroom);1-15 single-walled carbon nanotubes per micron density
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Aixtron Black Magic graphene CVD furnace aixtron-graphene |
CVD graphene furnace Aixtron Black Magic training |
Flexible |
SNF Exfab Paul G Allen L119 Año Nuevo |
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Aixtron MOCVD - III-N system aix-ccs |
MOCVD - III-N Aixtron training |
Clean (MOCVD) |
SNF MOCVD Paul G Allen 213XA |
N and P doping available.
For Si clean: SC1, SC2, HF dip.
For Sapphire clean: SC1, SC2.
For GaN template on Si or Sapphire: Piranha, SC1, SC2.
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Aixtron MOCVD - III-V system aix200 |
MOCVD - III-V Aixtron training |
Flexible |
SNF MOCVD Paul G Allen 213XA |
N and P doping available.
For Si clean: SC1, SC2, HF dip.
For III-V clean: HCl or HF dip.
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PDS 2010 LABCOTER™ 2 Parylene Deposition System parcoater |
Parylene Coater Training |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
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Plasmaetch PE-50 plasma-etch |
Plasmaetch PE-50 Training |
Flexible |
SNF Exfab Paul G Allen 155 Mavericks |
Low power, high pressure plasma; low bias, minimal damage. Often used for surface treatment At SNF - nSiL lab
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