Oxford Dielectric Etcher (oxford-rie)
The OX-RIE Oxford etcher is a reactive ion etcher (RIE), designed for etching various di-electric materials . The OX-RIE is currently approved to etch silicon and carbon based materials only. Please contact staff in charge for approval to etch other substrates.
Capabilities and Specifications
Primary Materials Etched
Primary Materials Etched:
4" wafers; can be adopted to do 6" or 8" wafers; pieces need to be bonded to carrier wafers
Lab Organization, Location, and Badger Information
Training and Maintenance
Steps to become a tool user
The following step Online Course is optional:
for general information about the online training. Go to Online Nano Course Login
to log in directly to the course.
Go to "nano@stanford
" and then to the "Dry Etching" section for the three videos on plasma etching principles and to "Choosing a Dry Etching Process" section for guidelines for choosing the right equipment.
Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF