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Stanford Nanofabrication Facility
Lab User Guide
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1.0 General Policies
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4.0 General Chemical Safety
5.0 Appendices
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Face shield cleaning using steamer
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Cliff Knollenberg
Contact Information
Phone:
(650)721-1274
Office:
Paul G. Allen 136
Email:
cknollen@stanford.edu
About
Lab Organization(s):
SNF
Role:
Process Engineer - Litho
Technical Liaison for:
Etching, MEMS, Optics, Process integration
Trainer for
ASML PAS 5500/60 i-line Stepper (asml)
EVG 101 Spray Coater (evgspraycoat)
EVG Contact Aligner (evalign)
EVG Wafer Bonder (evbond)
Flexus 2320 Stress Tester (stresstest)
Headway Manual Resist Spinner (headway2)
HMDS Vapor Prime Oven, YES (yes)
Laurell Manual Resist Spinner (laurell-R)
Lithography Solvent Bench (lithosolv)
Nanospec 3 (nanospec3)
Oven (White) (white-oven)
Oven 110°C post-bake (oven110)
Oven 90°C prebake (oven90)
Oven BlueM 200°C to 430°C (bluem)
SEM -Zeiss Merlin (sem-merlin)
Ultraviolet Photoresist Cure (uvcure)
Wet Bench Miscellaneous (wbmiscres)
Backup trainer for
Aligner Contact Karl Suss MA-6 (karlsuss)
Ex Fab Develop Wet Bench (wbexfab_dev)
Ex Fab Solvent Wet Bench (wbexfab_solv)
Headway 3 Manual Resist Spinner (headway3)
HMDS Vapor Prime Oven, YES2 (yes2)
Karl Suss MA-6 Contact Aligner (karlsuss2)
Mask Scrubber (masksrub)
Nanospec 210XP (nanospec2)
Oxford Dielectric Etcher (oxford-rie)
Oxford III-V etcher (Ox-35)
Plasma Therm Versaline LL ICP Deep Silicon Etcher (PT-DSE)
Plasma Therm Versaline LL ICP Dielectric Etcher (PT-Ox)
Plasma Therm Versaline LL ICP Metal Etcher (PT-MTL)
PlasmaTherm Versaline HDP CVD System (hdpcvd)
Profilometer Alphastep 500 (alphastep)
Profilometer AlphaStep D-300 (alphastep2)
Prometrix Resistivity Mapping System (prometrix)
Reflectance Spectrometer Filmetrics F40 (filmetrics)
Samco PC300 Plasma Etch System (samco)
Sensofar S-neox (s-neox)
STS Deep RIE Etcher (stsetch)
SVG Develop Track 1 (svgdev)
SVG Develop Track 2 (svgdev2)
SVG Resist Coat Track 1 (svgcoat)
SVG Resist Coat Track 2 (svgcoat2)