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Stanford Nanofabrication Facility
Lab User Guide
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1.0 General Policies
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4.0 General Chemical Safety
5.0 Appendices
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Face shield cleaning using steamer
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Cliff Knollenberg
Contact Information
Phone:
(650)721-1274
Office:
Paul G. Allen 136
Email:
cknollen@stanford.edu
About
Lab Organization(s):
SNF
Role:
Process Engineer - Litho
Technical Liaison for:
Etching, MEMS, Optics, Process integration
Trainer for
ASML PAS 5500/60 i-line Stepper (asml)
EV Group Contact Aligner (evalign)
EV Group Wafer Bonder (evbond)
EVG 101 Spray Coater (evgspraycoat)
Flexus 2320 Stress Tester (stresstest)
Headway Manual Resist Spinner (headway2)
HMDS Vapor Prime Oven, YES (yes)
Laurell Manual Resist Spinner (laurell-R)
Lithography Solvent Bench (lithosolv)
Nanospec 3 (nanospec3)
Oven 110°C post-bake (oven110)
Oven 90°C prebake (oven90)
Oven BlueM 200°C to 430°C (bluem)
Ultraviolet Photoresist Cure (uvcure)
Wet Bench Miscellaneous (wbmiscres)
White Oven (white-oven)
Backup trainer for
Alphastep 500 Profilometer (alphastep)
Ex Fab Develop Wet Bench (wbexfab_dev)
Ex Fab Solvent Wet Bench (wbexfab_solv)
Headway 3 Manual Resist Spinner (headway3)
HMDS Vapor Prime Oven, YES2 (yes2)
Karl Suss MA-6 Contact Aligner 1 (karlsuss)
Karl Suss MA-6 Contact Aligner 2 (karlsuss2)
Mask Scrubber (masksrub)
Nanospec 210XP (nanospec2)
Oxford Dielectric Etcher (oxford-rie)
Oxford III-V etcher (Ox-35)
Plasma Therm Versaline LL ICP Deep Silicon Etcher (PT-DSE)
Plasma Therm Versaline LL ICP Dielectric Etcher (PT-Ox)
Plasma Therm Versaline LL ICP Metal Etcher (PT-MTL)
PlasmaTherm Versaline HDP CVD System (hdpcvd)
Reflectance Spectrometer Filmetrics F40 (filmetrics)
Samco PC300 Plasma Etch System (samco)
STS Deep RIE Etcher (stsetch)
SVG Develop Track 1 (svgdev)
SVG Develop Track 2 (svgdev2)
SVG Resist Coat Track 1 (svgcoat)
SVG Resist Coat Track 2 (svgcoat2)
