Skip to content Skip to navigation

Flexible

The "Flexible" cleanliness group is part of the SNF/ExFab contamination policy. For more information please click here.

The following is a list of equipment that fall into the "Flexible" category.

Equipment name & Badger ID	Training Required & Charges	Cleanliness	Lab Organization	Location	Notes
Finetech Lambda flipchipbonder	Flip Chip Bonder Training	Flexible	SNF	SNF Exfab Paul G Allen 104 Stinson
First Nano carbon nanotube CVD furnace cvd-nanotube	cvd-nanotube training	Flexible	SNF	SNF Exfab Paul G Allen L119 Año Nuevo	Aligned single-walled carbon nanotube growth with ST-cut quartz substrates (available from SNF stockroom);1-15 single-walled carbon nanotubes per micron density
Fisher Accuspin 24C centrifuge	Centrifuge Training	Flexible	SNF	SNF Exfab Paul G Allen 155 Mavericks
Formlabs Form2 3D Printer form2-3d-printer	Form2 3D Printer Training	Flexible	SNF	SNF Exfab Paul G Allen 155 Mavericks
Fujifilm Dimatix Ink Jet Printer nanoinkjet	Dimatix Ink Jet Printer Training	Flexible	SNF	SNF Exfab Paul G Allen 155 Mavericks
Fumehood 1 fumehood1	Fumehood 1 Training	Flexible	SNF	SNF Exfab Paul G Allen 155 Mavericks
Fumehood 2 fumehood2	Fumehood 2 Training	Flexible	SNF	SNF Exfab Paul G Allen 155 Mavericks
Fumehood 3 fumehood3	Fumehood 3 Training	Flexible	SNF	SNF Exfab Paul G Allen 155 Mavericks
Fumehood 4 fumehood4	Fumehood 4 Training	Flexible	SNF	SNF Exfab Paul G Allen 155 Mavericks
Glovebox-l glovebox-l	Glovebox-l Training	Flexible	SNF	SNF Exfab Paul G Allen 155 Mavericks
Glovebox-r glovebox-r	Glovebox-r Training	Flexible	SNF	SNF Exfab Paul G Allen 155 Mavericks
GnP POLI-400L cmp	CMP Training	Flexible	SNF	SNF Exfab Paul G Allen 159 Capitola
Headway 3 Manual Resist Spinner headway3	Headway 3 Training	Flexible	SNF	SNF Exfab Paul G Allen 104 Stinson
Hummer V Sputter Coater hummer	Hummer V Sputter Coater Training	Flexible	SNF	SNF Exfab Paul G Allen L119 Año Nuevo
Ika T18 Disperser disperser	IKA Disperser Training	Flexible	SNF	SNF Exfab Paul G Allen 155 Mavericks
Innotec Evaporator Innotec	Innotec Evaporator Training	Flexible	SNF	SNF Cleanroom Paul G Allen L107	Precious metals limit is <200nm
Jasco UV-Vis-NIR jasco-uv-vis-nir	Jasco UV-Vis-NIR Training	Flexible	SNF	SNF Exfab Paul G Allen 151 Ocean
Lesker Sputter lesker-sputter	Lesker Sputter Training	Flexible	SNF Exfab	SNF Exfab Paul G Allen 155A Venice	reactive O2/N2 sputtering, substrate bias, substrate heating, co-sputter
Lithography Solvent Bench lithosolv	Lithography Solvent Bench Training	Flexible	SNF	SNF Cleanroom Paul G Allen L107	Manual solvent cleaning of substrates or masks. Teflon coated metal tweezers cleaning.
Malvern Dynamic Light Scattering (DLS) Zetasizer malvern-dls	Malvern Dynamic Light Scattering (DLS) Zetasizer Training	Flexible	SNF Exfab	SNF Exfab Paul G Allen 155 Mavericks

Pages

Equipment name & Badger ID	Technique	Cleanliness	Material Thickness Range	Materials Lab Supplied	Materials User Supplied	Minimum Resolution	Resist	Objective Separation	Process Temperature Range	Chemicals	Gases	Accessories Available	Substrate Size	Substrate Type	Maximum Load
Finetech Lambda flipchipbonder	Bonding	Flexible							°C - 400 °C				Pieces 4"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge)	1
First Nano carbon nanotube CVD furnace cvd-nanotube	Deposition > Chemical Vapor Deposition (CVD) > Carbon Nanotube CVD Growth	Flexible		CNT					800 °C - 1100 °C		Ar C₂H₅OH CH₄ H₂ O₂		Pieces 2" 3" 4"	(Si) , (SiO2)	1x4" wafer or multiple pieces
Fisher Accuspin 24C centrifuge	Centrifugation	Flexible
Formlabs Form2 3D Printer form2-3d-printer	3D Printing	Flexible													Multiple parts - depending on the final part size
Fujifilm Dimatix Ink Jet Printer nanoinkjet	Deposition > Ink	Flexible		PROM Approval Required for Materials
Fumehood 1 fumehood1	Controlled Environment	Flexible
Fumehood 2 fumehood2	Controlled Environment	Flexible
Fumehood 3 fumehood3	Controlled Environment	Flexible
Fumehood 4 fumehood4	Controlled Environment	Flexible
Glovebox-l glovebox-l	Controlled Environment	Flexible
Glovebox-r glovebox-r	Controlled Environment Material Transfer	Flexible		Various 2D Materials							N₂
GnP POLI-400L cmp	Machining > Wafer Polishing	Flexible
Headway 3 Manual Resist Spinner headway3	Optical Photolithography > Resist coat > Resist Coat (manual)	Flexible					Resists Shipley 3612 resist SPR220-3 resist SPR220-7						Pieces 2" 3" 4"		1 piece or wafer
Hummer V Sputter Coater hummer	Deposition > Physical Vapor Deposition (PVD) > Sputtering	Flexible
Ika T18 Disperser disperser	Sonication	Flexible
Innotec Evaporator Innotec	Deposition > Physical Vapor Deposition (PVD) > Evaporation	Flexible		Ag Al Au Co Cr Cu Fe Ge In Ni Pd Si Ta Ti W Moly	Er Hf Ir Ru Tb Y								Pieces 2" 3" 4" 6"	(Si) , (SiGe) , (SiO2)	22 four inch wafers
Jasco UV-Vis-NIR jasco-uv-vis-nir	Characterization	Flexible
Lesker Sputter lesker-sputter	Deposition > Physical Vapor Deposition (PVD) > Sputtering	Flexible		Ag Al AlSi Au Co Cr Cu Fe Nb Ni Pd Si SiO₂ Ta Ti TiN W Alumina ITO	CoFeB Ge Hf In₂O₃ LaB₆ Ru Sc Sn TiN WO₃ ZnO₃ ZrY GST Hafnia Moly Ti Tungsten								Pieces 2" 3" 4" 6"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (SiC) , (GaN) , (III-V) , (GaAs)	1 4 inch wafer, 1 6 inch wafer
Lithography Solvent Bench lithosolv	Cleaning > Solvent Cleaning	Flexible								Solvents			Pieces 2" 3" 4" 6"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (GaN) , (III-V) , (GaAs)
Malvern Dynamic Light Scattering (DLS) Zetasizer malvern-dls	Characterization > Dynamic Light Scattering	Flexible										Integrating Sphere	Pieces Other

Pages