SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
The "Flexible" cleanliness group is part of the SNF/ExFab contamination policy. For more information please click here.
The following is a list of equipment that fall into the "Flexible" category.
Equipment name & Badger ID | Technique | Cleanliness | Material Thickness Range | Materials Lab Supplied | Materials User Supplied | Minimum Resolution | Resist | Objective Separation | Process Temperature Range | Chemicals | Gases | Accessories Available | Substrate Size | Substrate Type | Maximum Load |
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Finetech Lambda flipchipbonder |
Flexible |
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°C - 400 °C
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First Nano carbon nanotube CVD furnace cvd-nanotube |
Flexible |
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800 °C - 1100 °C
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1x4" wafer or multiple pieces | ||||||||
Fisher Accuspin 24C centrifuge |
Flexible |
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Formlabs Form2 3D Printer form2-3d-printer |
Flexible |
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Multiple parts - depending on the final part size | |||||||||
Fujifilm Dimatix Ink Jet Printer nanoinkjet |
Flexible |
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Fumehood 1 fumehood1 |
Flexible |
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Fumehood 2 fumehood2 |
Flexible |
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Fumehood 3 fumehood3 |
Flexible |
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Fumehood 4 fumehood4 |
Flexible |
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Glovebox-l glovebox-l |
Flexible |
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Glovebox-r glovebox-r |
Flexible |
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GnP POLI-400L cmp |
Flexible |
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Headway 3 Manual Resist Spinner headway3 |
Flexible |
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1 piece or wafer | |||||||||
Hummer V Sputter Coater hummer |
Flexible |
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Ika T18 Disperser disperser |
Flexible |
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Innotec Evaporator Innotec |
Flexible |
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22 four inch wafers | ||||||||
Jasco UV-Vis-NIR jasco-uv-vis-nir |
Flexible |
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Lesker Sputter lesker-sputter |
Flexible |
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1 4 inch wafer, 1 6 inch wafer | ||||||||
Lithography Solvent Bench lithosolv |
Flexible |
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Malvern Dynamic Light Scattering (DLS) Zetasizer malvern-dls |
Flexible |
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Integrating Sphere |