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Flexible

The "Flexible" cleanliness group is part of the SNF/ExFab contamination policy. For more information please click here.

The following is a list of equipment that fall into the "Flexible" category.

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Equipment name & Badger ID Training Required & Charges Cleanliness Lab Organization Location Notes
Matrix Plasma Resist Strip
matrix
Matrix Plasma Resist Strip Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Single wafer tool with auto loading from a cassette. Pieces need a pocket carrier wafer for transport. Chuck temperature controls wafer heating.

Micro Mist Coater PDR-04
micromist-coater
Micromist Coater Training Flexible
SNF
SNF Exfab Paul G Allen 104 Stinson
Minitech-GX Micromill
micromill
Micromill Training Flexible
SNF
SNF Exfab Paul G Allen 155 Mavericks
MRC Reactive Ion Etcher
mrc
MRC Reactive Ion Etcher Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Typically used for sputter etching; Single wafer, direct load system; wafers/ pieces can be directly placed on electrode

MVD
mvd
MVD Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Reactor located inside glovebox

Nanospec 3
nanospec3
Nanospec 3 Training Flexible
SNF
SNF Cleanroom Paul G Allen L107
Optomec Printer
optomec-printer
Optomec Printer Training Flexible
SNF
SNF Exfab Paul G Allen 155A Venice
Oriel Deep UV Exposure Lamp
oriel-duv
Oriel DUV Training Flexible
SNF
SNF Exfab Paul G Allen 155A Venice
Oxford Dielectric Etcher
oxford-rie
Oxford Dielectric Etcher Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

4" wafers; can be adopted to do 6" or 8" wafers; pieces need to be bonded to carrier wafers

Oxford III-V etcher
Ox-35
Oxford III-V etcher Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

4" wafers; can be adopted to do 6" or 8" wafers; pieces need to be bonded to carrier wafers; Restrictions: III-V materials only.

PDMS Hotplate
hotplate-1
PDMS Hotplate Training Flexible
SNF
SNF Exfab Paul G Allen 155 Mavericks
PDMS Spin Coater
spincoat-g3p8
PDMS Spin Coater Training Flexible
SNF
SNF Exfab Paul G Allen 155 Mavericks
PDMS Workbench PDMS Workbench Training Flexible
SNF
SNF Exfab Paul G Allen 155 Mavericks
PDS 2010 LABCOTER™ 2 Parylene Deposition System
parcoater
Parylene Coater Training Flexible
SNF
SNF Exfab Paul G Allen 155 Mavericks
Plasma Therm Versaline LL ICP Deep Silicon Etcher
PT-DSE
Plasma Therm Versaline LL ICP Deep Silicon Etcher Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Single wafer; Bosch process for Si etching; Default 4" config; Can be converted to 6" config; pieces need to be attached to carrier wafer; need a support wafer for through wafer etching, can be used for Isotropic Si Etching

Plasma Therm Versaline LL ICP Dielectric Etcher
PT-Ox
Plasma Therm Versaline LL ICP Dielectric Etcher Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Single wafer; Default 4" config; Can be converted to 6" config; pieces need to be attached to carrier wafer; Restrictions: Can not etch metals or metal oxides with no volatile by-products (shorting & arcing issues)

Plasma Therm Versaline LL ICP Metal Etcher
PT-MTL
Plasma Therm Versaline LL ICP Metal Etcher Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

Single wafer; Default 4" config; Can be converted to 6" config; pieces need to be attached to carrier wafer; Restrictions: Can not etch metals or metal oxides with no volatile by-products (shorting & arcing issues)

Plasmaetch PE-50
plasma-etch
Plasmaetch PE-50 Training Flexible
SNF
SNF Exfab Paul G Allen 155 Mavericks

Low power, high pressure plasma; low bias, minimal damage. Often used for surface treatment At SNF - nSiL lab

QSonica Q700 Sonicator
sonicator
Probe Sonicator Training Flexible
SNF
SNF Exfab Paul G Allen 155 Mavericks
Samco PC300 Plasma Etch System
samco
Samco Training Flexible
SNF
SNF Cleanroom Paul G Allen L107

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Equipment name & Badger ID Technique Cleanliness Primary Materials Etched Other Materials Etched Material Thickness Range Materials Lab Supplied Minimum Resolution Objective Separation Process Temperature Range Gases Substrate Size Substrate Type Maximum Load
Matrix Plasma Resist Strip
matrix
Flexible
,
,
,
,
25
Micro Mist Coater PDR-04
micromist-coater
Flexible
Minitech-GX Micromill
micromill
Flexible
MRC Reactive Ion Etcher
mrc
Flexible
1
MVD
mvd
Flexible
1 Å - 50 nm
24 °C - 150 °C
Nanospec 3
nanospec3
Flexible
Optomec Printer
optomec-printer
Flexible
Oriel Deep UV Exposure Lamp
oriel-duv
Flexible
Oxford Dielectric Etcher
oxford-rie
Flexible
,
,
,
,
1
Oxford III-V etcher
Ox-35
Flexible
1
PDMS Hotplate
hotplate-1
Flexible
PDMS Spin Coater
spincoat-g3p8
Flexible
PDMS Workbench Flexible
PDS 2010 LABCOTER™ 2 Parylene Deposition System
parcoater
Flexible
,
,
,
,
,
,
,
,
,
,
,
,
Plasma Therm Versaline LL ICP Deep Silicon Etcher
PT-DSE
Flexible
1
Plasma Therm Versaline LL ICP Dielectric Etcher
PT-Ox
Flexible
1
Plasma Therm Versaline LL ICP Metal Etcher
PT-MTL
Flexible
1
Plasmaetch PE-50
plasma-etch
Flexible
Multiple
QSonica Q700 Sonicator
sonicator
Flexible
Samco PC300 Plasma Etch System
samco
Flexible
20 ºC
,
,
,
,
,
,
,
,
,
,
,
,
,
Four 4" wafers or two 6" wafers and one 8" wafer

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