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MVD (mvd)

Overview

MVD is a molecular vapor deposition (MVD) system. It is a self assembling monolayers (SAMs)-based configuration of a Savannah S200 from Cambridge Nanotech with 1 SAMs delivery port and 4 standard atomic layer deposition (ALD) lines.  It is used to deposit organic SAMS layers and metal oxides on 2-D materials. The system can accommodate pieces up to an 8" wafer. Many thanks to Xiaoxing Xu, Ateeq Suria, Alex Piggott, and Felix Alfonso for their contributions to this page.

Cleanliness: 

Capabilities and Specifications

Material Thickness Range: 1.0 Å - 50.0 nm
Process Temperature Range: 
24 °C - 150 °C
Notes: 

Reactor located inside glovebox

Lab Facility, Location, and Badger Information

Training and Maintenance

Lab Facility: 
Training Charges: 
3.00 hours
Primary Trainer: 
Backup Trainer(s): 
Primary Maintenance: 

Steps to become a tool user

  1. Become a member of SNF.
  1. Read the relevant operating procedures:
  2. Shadow labmembers who are using the MVD. Make sure to ask lots of questions until you feel familiar that you could run it yourself.
  3. Contact to set up an appointment for the written quiz. If you are having trouble finding someone to shadow, please contact Michelle.
  4. After successfully passing the written quiz, you will set up a time for the final practical in-lab session.

Operating Instructions