Oven 110°C post-bake (oven110)
The 110°C Oven bakes the wafers with resist at 110ºC after the development, called post-bake.
Capabilities and Specifications
Process Temperature Range:
Bakes wafers with resist after the development, called post-bake.
Lab Organization, Location, and Badger Information
Training and Maintenance
Steps to become a tool user
Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF