Equipment name & NEMO ID | Training Required & Charges | Cleanliness | Location | Notes |
---|---|---|---|---|
SEM -Zeiss Merlin sem-merlin |
SEM-Merlin Training | All | SNF Exfab Paul G Allen 104 Stinson | |
Profilometer AlphaStep D-300 alphastep2 |
AlphaStep2 Training | Flexible | SNF Exfab Paul G Allen 104 Stinson | |
Nanospec 210XP nanospec2 |
Nanospec Training | All | SNF Exfab Paul G Allen 104 Stinson |
Manual Film Thickness Measurement. Single or dual layer transparent films > 300 Ã |
Profilometer Alphastep 500 alphastep |
Alphastep 500 Profilometer Training | Flexible | SNF Exfab Paul G Allen 104 Stinson |
500Å to 300µm |
Equipment name & NEMO ID | Technique | Cleanliness | Primary Materials Etched | Developer | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|
Wet Bench Miscellaneous wbmiscres |
Flexible |
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Wet Bench Solvent Lithography lithosolv |
Flexible |
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Woollam woollam |
All |
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Xactix Xenon Difluoride Etcher xactix |
All |
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1 |