Equipment name & NEMO ID | Training Required & Charges | Cleanliness | Location | Notes |
---|---|---|---|---|
Profilometer Alphastep 500 alphastep |
Alphastep 500 Profilometer Training | Flexible | SNF Exfab Paul G Allen 104 Stinson |
500Å to 300µm |
Oven 110°C post-bake oven110 |
Resist Postbake Oven 110°C Training | All | SNF Cleanroom Paul G Allen L107 |
Bakes wafers with resist after the development, called post-bake. |
Oven 90°C prebake oven90 |
Resist Prebake Oven 90°C Training | All | SNF Cleanroom Paul G Allen L107 |
Bakes wafers after resist coating. |
Aixtron MOCVD - III-V system aix200 |
MOCVD - III-V Aixtron training | Flexible | SNF MOCVD Paul G Allen 213XA |
N and P doping available. |
Equipment name & NEMO ID | Technique | Cleanliness | Primary Materials Etched | Developer | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|
Wet Bench Miscellaneous wbmiscres |
Flexible |
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Wet Bench Solvent Lithography lithosolv |
Flexible |
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Woollam woollam |
All |
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1 | ||||||
Xactix Xenon Difluoride Etcher xactix |
All |
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1 |