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Function and Method(s):
Atomic Layer Deposition (ALD)
Equipment Used:
Savannah ALD (savannah)
High-k/SiO2 Interface Charge Characterization for ALD Tools- Final Report
High-k/SiO2 Interface Charge Characterization for ALD Tools- Final Report
PDF File:
High-k/SiO2 Interface Charge Characterization for ALD Tools- Final Report
This should be displaying the file at https://snfguide.stanford.edu/sites/default/files/sections/diplayfiles/interface_states_in_ald_films_report.pdf inline. If it's not, look to see if your browser is set to automatically download pdf filess
Materials
Alumina (Al
2
O
3
)
Hafnia (HfO
2
)
Thursday, August 10, 2023
