ProM Request archive
This is an archive of requests from 2013 to 2021. New requests are not being added here.
| PROM Request Title | PROM Date | PROM Request Summary | Equipment List |
PROM Decision |
|---|---|---|---|---|
| Bring in_Store negative e-beam resists ma-N 2403, AR-N 7520 | 11/25/2019 | Request for new ebeam resists to be used in the Laurell only. | ||
| Poly(4-hydroxystyrene) spin coating in SNF | 06/06/2019 | Bring in new chemistry to use with SNF spin coating. |
Headway Manual Resist Spinner (headway2), Profilometer Alphastep 500 (alphastep) |
Approved |
| InAs on GaAs piece in Fiji2 and Savannah | 10/07/2014 | Request to process InAs deposited on GaAs in gold-contamination ALD tools (Savannah and Fiji2). |
Fiji 2 ALD (fiji2), Savannah ALD (savannah) |
Approved for documented quantities. Pieces need to cool in load lock before retrieval on Fiji2. |
| Etching Y on MoS2 substrate at wbflexcorr | 10/07/2014 | Request to etch Y at wbflexcorr. | Wet Bench Flexcorr 1 (wbflexcorr-1) | Approved for documented quantities. Re-approval required if quantities change. |
| Etching Polyacrylonitrile-Lithium Perchlorate membrane with Au mask | 03/17/2014 | Request to use PAN-LiClO4 film in PT-OX. Concern is using Li compounds in the shared equipment. | Plasma Therm Versaline LL ICP Dielectric Etcher (PT-Ox) | Approved for documented runs. Additional runs or larger substrates will require review by PROM committee. |
| Spin coat substrates with graphene | 02/11/2014 | Request to use Headway spinner in SNF to spin coat graphene particles on substrates. |
Headway Manual Resist Spinner (headway2), Laurell Manual Resist Spinner (laurell-R) |
Approved for Laurell spinner OUTSIDE of SNF. No loose nanoparticles to be spun inside of cleanroom. |
| Spin coating of ladder polymer on silicon chips | 09/13/2016 | Polymer synthesized in Prof. Xia's group (Chemistry) to be spin coated in SNF. | Approved for spin coater in CMP room. | |
| Contamination Study of Semi-Clean SiGe in LAMpoly | 02/02/2015 | Request to perform contamination study of Semi-Clean SiGe in LAMpoly. |
Lam Research TCP 9400 Poly Etcher (lampoly), CMP GnP POLI-400L (cmp) |
Approved for study. Resubmission is required after data is collected. // Update 2/18/15: TiN layer deposition at Berkeley is approved due to extended Fiji1 downtime. // Update 3/31/15: Contamination data appended. Process flow is approved. |
| Aqua Regia etch of Pt in SNF | 05/22/2019 | Addresses safety concerns and details of processing required for etch. Each etch will require PROM committee notification. | Approved for this use only. Please see process staff for details | |
| Request to use Dynaloy Dynastrip | 05/06/2016 | Request to use Dynaloy Dynasrip in the SNF. | Plasma Therm Versaline LL ICP Deep Silicon Etcher (PT-DSE) | Approved for use in the solvent bench. Separate waste collection and tagging required. |
