Headway Manual Resist Spinner (headway2)
The Headway Coater is used to apply photoresist to any substrate. Centrifugal force uniformly spreads fluid across the surface of the spinning substrate. The spin speed, spin time, and substrate and fluid properties determine the final thickness of the film.
Capabilities and Specifications
Adjustable spin speeds, spin time. SNF-acceptable resists or polymers. Ebeam resists
Lab Organization, Location, and Badger Information
Training and Maintenance
Steps to become a tool user
Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
Headway 2 and 3 are trained together.