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Laurell Manual Resist Spinner (laurell-R)

Cleanliness: 
All

Processing Technique(s)

Capabilities and Specifications

Lithography Specifications

Resist: 
Resists
SU-8
Lift Off Layer
Process Temperature Range: 
Notes: 

SU-8, LOL, Ebeam resists allowed. No Acetone allowed. 

Lab Facility, Location, and Badger Information

Lab Organization: 
Stanford Nanofabrication Facility Cleanroom (SNF Cleanroom)
Location: 
SNF Cleanroom Paul G Allen L107
Badger Area: 
SNF: Photolithography
Badger ID: 
laurell-R

Training and Maintenance

Lab Facility: 
SNF Cleanroom
Training Charges: 
1.00 hours
Primary Trainer: 
Cliff Knollenberg
Backup Trainer(s): 
Swaroop Kommera
Primary Maintenance: 
Mario Vilanova
Backup Maintenance: 
Gary Sosa

Steps to become a tool user

  1. Become a member of SNF.
  1. "All Litho" class is required before training on any of the lithography tools. Please send an email to all-litho-training@lists.stanford.edu to sign up for the All Litho class. Read more here: All Litho class.
  2. Read the relevant operating procedures:
  3. Contact the primary trainer:
    .

Operating Instructions

Laurell Manual Resist Spinner - R