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Stanford Nanofabrication Facility
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New Normal Rules
. ANY shadowing must be coordinated with SNF staff first.
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New Normal Policies
Equipment
Equipment Table
Characterization Equipment
CVD Equipment
Doping Equipment
Dry Etch Equipment
Metallization Equipment
Photolithography Equipment
Wet Bench Equipment
Operating Instructions
Laurell Manual Resist Spinner - R
Related Documentation
PROM Request(s)
Introduction of EBR PG Wash Bottle for litho solvent bench
Spin coat substrates with graphene
Use of InP and ZnS Quantum Dots in Toluene in laurell-g
Use of polystyrene suspension in Laurell Manual Resist Spinner
Use of TFB and m-xylene in laurell-g
Laurell Manual Resist Spinner (laurell-R)
Cleanliness:
All
Processing Technique(s)
Optical Photolithography
>
Resist coat
>
Resist Coat (manual)
Capabilities and Specifications
Lithography Specifications
Resist:
Resists
SU-8
Lift Off Layer
Process Temperature Range:
Chemicals
PMMA
Substrate Sizes
Pieces
2 inch wafer
3 inch wafer
4 inch wafer
6 inch wafer
Notes:
SU-8, LOL, Ebeam resists allowed. No Acetone allowed.
Lab Facility, Location, and Badger Information
Lab Organization:
Stanford Nanofabrication Facility Cleanroom (SNF Cleanroom)
Location:
SNF Cleanroom Paul G Allen L107
Badger Area:
SNF: Photolithography
Badger ID:
laurell-R
Training and Maintenance
Lab Facility:
SNF Cleanroom
Training Charges:
1.00 hours
Primary Trainer:
Cliff Knollenberg
Backup Trainer(s):
Swaroop Kommera
Primary Maintenance:
Mario Vilanova
Backup Maintenance:
Gary Sosa
Steps to become a tool user
Become a
member of SNF
.
"All Litho" class is required before training on any of the lithography tools. Please send an email to
all-litho-training@lists.stanford.edu
to sign up for the All Litho class. Read more here:
All Litho class
.
Read the relevant operating procedures:
Laurell Manual Resist Spinner - R
Contact the primary trainer:
Cliff Knollenberg
.
Operating Instructions
Laurell Manual Resist Spinner - R
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