Lam Research TCP 9400 Poly Etcher (lampoly)
Lam 9400 TCP is a Polysilicon DryEtcher with Envision software; Clean category; for polysilicon and single crystal Silicon etches; maximum etch depth 3um.
Capabilities and Specifications
Primary Materials Etched
Primary Materials Etched:
Process Temperature Range:
Single wafer etch with auto-loading from a cassette. Equipment originally used for gate etching with high selectivity to thin gate oxides.
Lab Facility, Location, and Badger Information
Training and Maintenance
Steps to become a tool user
Check the training calendar for any scheduled training:
Read the relevant operating procedures:
Online training is optional. See Online training required. Open Online Course
for general information about the online training. for general information about the Lagunita online training.
Go to Go to Online Nano Course Login
to log in directly to the course. to log in directly to the course. Go to "nano@stanford" and then to the "Dry Etching" section for the three videos on plasma etching principles and to "Choosing a Dry Etching Process" section for guidelines for choosing the right equipment.
Attend the in-person training session to get qualified.