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Lam Research TCP 9400 Poly Etcher (lampoly)

Overview

photo of lampoly etcher in SNF cleanroom

Lampoly is a Transformer Coupled Plasma (TCP) etcher, generates a uniform, high density plasma for selective etching of silicon and polysilicon. It has two independent 13.56 MHz RF power supplies which deliver high and low power to the upper and lower electrodes, respectively.  A high density discharge is generated by the higher-power RF supply by inductive coupling of a planar source coil to the gas in the chamber.; Clean category; for polysilicon and single crystal Silicon etches; maximum etch depth 3um.

Cleanliness: 
Clean
Semiclean

Processing Technique(s)

Capabilities and Specifications

Maximum Load: 
25
Notes: 

Single wafer etch with auto-loading from a cassette. Equipment originally used for gate etching with high selectivity to thin gate oxides.

Lab Organization, Location, and Badger Information

Lab Organization: 
Stanford Nanofabrication Facility Cleanroom (SNF Cleanroom)
Location: 
SNF Cleanroom Paul G Allen L107
Badger Area: 
SNF: Dry Etching
Badger ID: 
lampoly

Training and Maintenance

Lab Facility: 
SNF Cleanroom
Training Charges: 
1.00 hours
Primary Trainer: 
Lavendra Mandyam
Primary Maintenance: 
Elmer Enriquez
Backup Maintenance: 
Mike Dickey

Steps to become a tool user

  1. Become a member of SNF.

  1. Study the relevant operating procedures:
  2. The following step Online Course is optional:

  3. Online Course for general information about the online training. Go to Online Nano Course Login to log in directly to the course.
    Go to "nano@stanford" and then to the "Dry Etching" section for the three videos on plasma etching principles and to "Choosing a Dry Etching Process" section for guidelines for choosing the right equipment.

  4. Shadowing is required. Contact a qualified lab member of the tool to arrange to ‘shadow’. It would be best to find someone who has used the system often. If you don’t know of anyone, you may check reservations or history to find a qualified user. We recommend that you be with the lab member for the full time while operating the tool and ask lots of questions during the shadowing. You may have to shadow a qualified user more than one time to be comfortable with the tool. Please follow the instructions on this form: Shadowing at SNF
  5. Contact the primary trainer: Lavendra Mandyam