Lampoly is a Transformer Coupled Plasma (TCP) etcher, generates a uniform, high density plasma for selective etching of silicon and polysilicon. It has two independent 13.56 MHz RF power supplies which deliver high and low power to the upper and lower electrodes, respectively. A high density discharge is generated by the higher-power RF supply by inductive coupling of a planar source coil to the gas in the chamber.; Clean category; for polysilicon and single crystal Silicon etches; maximum etch depth 3um.
Single wafer etch with auto-loading from a cassette. Equipment originally used for gate etching with high selectivity to thin gate oxides.
Online Course for general information about the online training. Go to Online Nano Course Login to log in directly to the course.
Go to "nano@stanford" and then to the "Dry Etching" section for the three videos on plasma etching principles and to "Choosing a Dry Etching Process" section for guidelines for choosing the right equipment.