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Lam Research TCP 9400 Poly Etcher (lampoly)

Overview

photo of lampoly etcher in SNF cleanroom

Lam 9400 TCP is a Polysilicon DryEtcher with Envision software; Clean category; for polysilicon and single crystal Silicon etches; maximum etch depth 3um.

Cleanliness: 
Clean
Semiclean

Processing Technique(s)

Capabilities and Specifications

Process Temperature Range: 
Maximum Load: 
25
Notes: 

Single wafer etch with auto-loading from a cassette. Equipment originally used for gate etching with high selectivity to thin gate oxides.

Lab Facility, Location, and Badger Information

Lab Organization: 
Stanford Nanofabrication Facility Cleanroom (SNF Cleanroom)
Location: 
SNF Cleanroom Paul G Allen L107
Badger Area: 
SNF: Dry Etching
Badger ID: 
lampoly

Training and Maintenance

Lab Facility: 
SNF Cleanroom
Training Charges: 
1.00 hours
Primary Trainer: 
Lavendra Mandyam
Primary Maintenance: 
Elmer Enriquez
Backup Maintenance: 
Mike Dickey

Steps to become a tool user

  1. Become a member of SNF.
  1. Check the training calendar for any scheduled training:
    .
  2. Contact the primary trainer,
    , to sign up for the training or to schedule a training if none is scheduled.
  3. Read the relevant operating procedures:
  4. Online training is optional. See Online training required. Open Online Course for general information about the online training. for general information about the Lagunita online training.
    Go to  Go to Online Nano Course Login to log in directly to the course. to log in directly to the course. Go to "nano@stanford" and then to the "Dry Etching" section for the three videos on plasma etching principles and to "Choosing a Dry Etching Process" section for guidelines for choosing the right equipment.
  5. Attend the in-person training session to get qualified.