SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
The "Clean (Ge)" cleanliness group is part of the SNF/ExFab contamination policy. For more information please click here.
The following is a list of equipment that fall into the "Clean (Ge)" category.
Equipment name & Badger ID |
Training Required & Charges![]() |
Cleanliness | Lab Organization | Location | Notes |
---|---|---|---|---|---|
AMAT P5000 Etcher p5000etch |
AMAT P5000 Etcher Training | Clean, Clean (Ge), Semiclean | SNF Cleanroom Paul G Allen L107 | ||
Wet Bench Germanium wbgen2 |
Wet Bench Germanium Training | Clean (Ge) | SNF Cleanroom Paul G Allen L107 |
Clean Germanium wafers only: Pre-Diffusion Clean |
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Wet Bench Resist Strip wbresstrip-1 |
Wet Bench Resist Strip | Clean (Ge), Semiclean, Flexible | SNF Cleanroom Paul G Allen L107 |
Wet Resist Removal: SRS-100 or PRS1000 |
Equipment name & Badger ID | Technique | Cleanliness | Primary Materials Etched | Other Materials Etched | Material Thickness Range | Minimum Resolution | Objective Separation | Process Temperature Range | Chemicals | Gases | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|
AMAT P5000 Etcher p5000etch |
Clean, Clean (Ge), Semiclean |
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Wet Bench Germanium wbgen2 |
Clean (Ge) |
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25 | |||||||
Wet Bench Resist Strip wbresstrip-1 |
Clean (Ge), Semiclean, Flexible |
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20 °C - 60 °C
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25 4 inch wafers |