SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
Rapid Thermal Annealing
Rapid Thermal Annealing (RTA or RTP) is a heated process perfomeded in an Rapid Thermal Annealer to can change material properties of a sample. Anneal parameters include temperature, ramp time, anneal time, ambient gas. Gernerally anneal times range from seconds to 30 minutes.
Because of the small chamber size and quartz lamps, the RTA can heat and cool much quicker than a furnace but can accommodate fewer samples.
| Equipment name & Badger ID | Image | Cleanliness | Cleaning Required | Gases | Substrate Size | Process Temperature Range | Maximum Load (number of wafers) | Notes |
|---|---|---|---|---|---|---|---|---|
|
Aw610_l aw610_l |
 |
Clean | Pre-Diffusion Clean |
21 °C - 1150 °C
|
1 wafer | |||
|
Aw610_r aw610_r |
 |
Flexible |
21 °C - 1150 °C
|
