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Rapid Thermal Annealing

Rapid Thermal Annealing (RTA or RTP)  is a heated process perfomeded in an Rapid Thermal Annealer to can change material properties of a sample.  Anneal parameters include temperature, ramp time, anneal time, ambient gas.  Gernerally anneal times range from seconds to 30 minutes.

Because of the small chamber size and quartz lamps, the RTA can heat and cool much quicker than a furnace but can accommodate fewer samples.

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Equipment name & Badger ID Image Cleanliness Cleaning Required Gases Substrate Size Process Temperature Range Maximum Load (number of wafers) Notes
Allwin 610 Rapid Thermal Process Systems photo
Clean Pre-Diffusion Clean
21 °C - 1150 °C
1 wafer
SNF-Allwin 610 Rapid Thermal Process Systems
21 °C - 1150 °C