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Silicon Nitride Wet Etching

Heated phosphoric acid is used for removal of silicon nitrides. 

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Equipment name & Badger ID Location Image Overview Primary Materials Etched Link to Trainingsort descending
Wet Bench Clean_res- hotphos
wbclean_res-hotphos
SNF Cleanroom Paul G Allen L107

The wbclean_res-hotphos is part of the Wet Bench Clean_-res-piranha-hf-hotphos. This bench (semi-automated) is part of...Read more

Wet Bench Clean Piranha/HF/Phosphoric Training