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Vertical Semiconductor Blades

Project Type: 
E241
Date: 
June 2015
Areas of Interest: 
MOCVD, ASML, double exposure, JEOL, InSb, Ox III-V
Function and Method: 
Deposited III-V
Reactive Ion Etching (RIE)
Optical Photolithography
Researchers and (Mentors): 
Martin Winterkorn, Anup Dadlani, Karen Kim, (J Provine)
List of Important Equipment: 
ASML PAS 5500/60 i-line Stepper (asml)
Aix-ccs (aix-ccs)
Oxford III-V etcher (Ox-35)
Presentation(s): 
Vertical Quantum Confinement Structures- Final Presentation
Report(s): 
Vertical Semiconductor Blades- Final Report