Skip to content
Skip to navigation
SUNetID Login
SUNetID Login
Stanford Nanofabrication Facility
SNF is open under
New Normal Rules
. ANY shadowing must be coordinated with SNF staff first.
Stanford Nanofabrication Facility
Navigation menu
SNF Main Menu
SNF Home
About
Overview
Mission
History
NNCI
Lab Spaces
Visit
Join
Overview
Getting Started in the SNF labs
Contacts
Rates
How to Join
Forms
Discussion Lists
Storage
Lab User Guide
Main menu
Home
Vertical Semiconductor Blades
Project Type:
E241
Date:
June 2015
Areas of Interest:
MOCVD, ASML, double exposure, JEOL, InSb, Ox III-V
Function and Method:
Deposited III-V
Reactive Ion Etching (RIE)
Optical Photolithography
Researchers and (Mentors):
Martin Winterkorn, Anup Dadlani, Karen Kim, (J Provine)
List of Important Equipment:
ASML PAS 5500/60 i-line Stepper (asml)
Aix-ccs (aix-ccs)
Oxford III-V etcher (Ox-35)
Presentation(s):
Vertical Quantum Confinement Structures- Final Presentation
Report(s):
Vertical Semiconductor Blades- Final Report
Printer-friendly version