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Function and Method(s):
Reactive Ion Etching (RIE)
Photolithography
Equipment Used:
Aixtron MOCVD - III-V system (aix200)
Oxford III-V etcher (Ox-35)
ASML PAS 5500/60 i-line Stepper (asml)
Vertical Quantum Confinement Structures- Final Presentation
Vertical Quantum Confinement Structures- Final Presentation
PDF File:
Vertical Quantum Confinement Structures- Final Presentation
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Materials
III-V materials (III-V materials)
Indium Antimonide (InSb)
Thursday, August 10, 2023
