Silicon
Chemical Formula:
Si
Equipment name & NEMO ID |
Technique | Cleanliness | Materials Lab Supplied | Process Temperature Range | Gases | Substrate Size | Substrate Type | Maximum Load |
|---|---|---|---|---|---|---|---|---|
|
Aixtron Black Magic graphene CVD furnace aixtron-graphene |
Flexible |
800 °C - 1100 °C
|
, |
1x4" wafer or Copper/Nickel foil |
