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Function and Method(s):
Plasma Enhanced (PE) CVD
Dry Etching
Equipment Used:
PlasmaTherm Shuttlelock PECVD System (ccp-dep)
Plasma Therm Versaline LL ICP Dielectric Etcher (PT-Ox)
SiNx PECVD and Nanostructure Etching Recipe Development- Final Report
SiNx PECVD and Nanostructure Etching Recipe Development- Final Report
PDF File:
SiNx PECVD and Nanostructure Etching Recipe Development- Final Report
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Materials
Silicon Nitride (Si3N4)
Wednesday, April 14, 2021
