The "Clean" cleanliness group is part of the SNF/ExFab contamination policy.
The following is a list of equipment that fall into the "Clean" category.
Equipment name & NEMO ID | Training Required & Charges | Cleanliness | Location | Notes |
---|---|---|---|---|
RTA AllWin 610 aw610_l |
AllWin 610 RTA Training | Clean | SNF Cleanroom Paul G Allen L107 | |
AJA2 Evaporator aja2-evap |
Evaporator AJA2 | Semiclean | SNF Cleanroom Paul G Allen L107 |
For more than 300nm deposition, please contact Graham Ewing<grahamj.ewing@stanford.edu> in advance |
Aixtron MOCVD - III-N system aix-ccs |
MOCVD - III-N Aixtron training | Clean (MOCVD) | SNF MOCVD Paul G Allen 213XA |
N and P doping available. |
Fiji 1 ALD fiji1 |
ALD Fiji 1 and 2 Training | Semiclean | SNF Cleanroom Paul G Allen L107 |
Equipment name & NEMO ID | Technique | Cleanliness | Primary Materials Etched | Process Temperature Range | Chemicals | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|
Wet Bench Clean_res-piranha wbclean_res-piranha |
Clean |
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Wet Bench CMOS Metal wbclean3 |
Semiclean |
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25 wafers | |||||
Wet Bench Decontamination wbdecon |
Clean |
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Wet Bench Resist Strip wbresstrip-1 |
Clean (Ge), Semiclean, Flexible |
20 °C - 60 °C
|
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25 4 inch wafers |