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Clean

The "Clean" cleanliness group is part of the SNF/ExFab contamination policy. For more information please click here.

The following is a list of equipment that fall into the "Clean" category.

Equipment name & Badger ID	Training Required & Charges	Cleanliness	Lab Organization	Location	Notes
Wet Bench Clean 1 wbclean-1	Wet Bench Clean 1 and 2 Training	Clean	SNF	SNF Cleanroom Paul G Allen L107	No resist allowed. Resist should have been removed at the wbclean_res-piranha.
Wet Bench Clean 2 wbclean-2	Wet Bench Clean 1 and 2 Training	Clean	SNF	SNF Cleanroom Paul G Allen L107	No resist allowed. Resist should have been removed at the wbclean_res-piranha
Wet Bench Clean_res- hotphos wbclean_res-hotphos	Wet Bench Clean Piranha/HF/Phosphoric Training	Clean	SNF	SNF Cleanroom Paul G Allen L107	Resist should have been removed
Wet Bench Clean_res-hf wbclean_res-hf	Wet Bench Clean Piranha/HF/Phosphoric Training	Clean	SNF	SNF Cleanroom Paul G Allen L107	Resist as mask allowed
Wet Bench Clean_res-piranha wbclean_res-piranha	Wet Bench Clean Piranha/HF/Phosphoric Training	Clean	SNF	SNF Cleanroom Paul G Allen L107	Resist will be removed
Wet Bench CMOS Metal (wbclean3) wbclean3	Wet Bench CMOS Metal (wbclean3) Training	Semiclean	SNF	SNF Cleanroom Paul G Allen L107	Al, Ti, or W wet etching or oxide etching
Wet Bench Decontamination wbdecon	Wet Bench Decontamination Training	Clean	SNF	SNF Cleanroom Paul G Allen L107	KOH or wafersaw or post-cmp decontamination
Wet Bench Germanium wbgen2	Wet Bench Germanium Training	Clean (Ge)	SNF	SNF Cleanroom Paul G Allen L107	Clean Germanium wafers only: Pre-Diffusion Clean
Wet Bench Resist Strip wbresstrip-1	Wet Bench Resist Strip	Clean (Ge), Semiclean, Flexible	SNF	SNF Cleanroom Paul G Allen L107	Wet Resist Removal: SRS-100 or PRS1000

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Equipment name & Badger ID	Technique	Cleanliness	Primary Materials Etched	Material Thickness Range	Minimum Resolution	Objective Separation	Process Temperature Range	Chemicals	Substrate Size	Substrate Type	Maximum Load
Wet Bench Clean 1 wbclean-1	Cleaning > Pre-Diffusion Clean Cleaning > Pre-Diffusion Clean > Pre-LPCVD or Pre-Metal Clean	Clean						50:1 HF SC1 SC2	3" 4" 6"	(Si) , (SiGe) , (SiO2)	25
Wet Bench Clean 2 wbclean-2	Cleaning > Pre-Diffusion Clean Cleaning > Pre-Diffusion Clean > Pre-LPCVD or Pre-Metal Clean	Clean						50:1 HF 6:1 BOE SC1 SC2	3" 4" 6"	(Si) , (SiGe) , (SiO2)	25
Wet Bench Clean_res- hotphos wbclean_res-hotphos	Etching > Wet Etching > Silicon Nitride Wet Etching	Clean	SiN					H₃PO₄	3" 4" 6"	(Si) , (SiGe) , (SiO2)
Wet Bench Clean_res-hf wbclean_res-hf	Etching > Wet Etching > Silicon Oxide Wet Etching	Clean	SiO					20:1 BOE 50:1 HF 6:1 BOE	3" 4" 6"	(Si) , (SiGe) , (SiO2)
Wet Bench Clean_res-piranha wbclean_res-piranha	Cleaning > Piranha Cleaning Cleaning > Resist Removal > Wet Resist Removal	Clean						9:1 Piranha	3" 4" 6"	(Si) , (SiGe) , (SiO2)
Wet Bench CMOS Metal (wbclean3) wbclean3	Etching > Wet Etching > Aluminum and Titanium and Tungsten Wet Etching	Semiclean	Al Ti W					20:1 BOE 50:1 HF 6:1 BOE Al-Etch Ti-Etch W-etch	3" 4" 6"	(Si) , (SiGe) , (SiO2)	25 wafers
Wet Bench Decontamination wbdecon	Cleaning > Decontamination	Clean						SC2	3" 4" 6"	(Si) , (SiGe) , (SiO2)
Wet Bench Germanium wbgen2	Cleaning > Pre-Diffusion Clean: Germanium	Clean (Ge)						50:1 HF	4"	(Ge)	25
Wet Bench Resist Strip wbresstrip-1	Cleaning > Resist Removal > Wet Resist Removal	Clean (Ge), Semiclean, Flexible	Resist				20 °C - 60 °C	PRS-1000 SRS-100	Pieces 2" 3" 4"	(Si) , (SiGe) , (SiO2) , (Al₂O₃) , (SiO₂) , (Ge) , (SiC)	25 4 inch wafers

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