SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
The "Clean" cleanliness group is part of the SNF/ExFab contamination policy. For more information please click here.
The following is a list of equipment that fall into the "Clean" category.
Equipment name & Badger ID | Technique | Cleanliness | Primary Materials Etched | Material Thickness Range | Minimum Resolution | Objective Separation | Process Temperature Range | Chemicals | Substrate Size | Substrate Type | Maximum Load |
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Wet Bench Clean 1 wbclean-1 |
Clean |
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25 | ||||
Wet Bench Clean 2 wbclean-2 |
Clean |
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25 | ||||
Wet Bench Clean_res- hotphos wbclean_res-hotphos |
Clean |
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Wet Bench Clean_res-hf wbclean_res-hf |
Clean |
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Wet Bench Clean_res-piranha wbclean_res-piranha |
Clean |
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Wet Bench CMOS Metal (wbclean3) wbclean3 |
Semiclean |
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25 wafers | ||||
Wet Bench Decontamination wbdecon |
Clean |
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Wet Bench Germanium wbgen2 |
Clean (Ge) |
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25 | |||||
Wet Bench Resist Strip wbresstrip-1 |
Clean (Ge), Semiclean, Flexible |
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20 °C - 60 °C
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25 4 inch wafers |