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Clean

The "Clean" cleanliness group is part of the SNF/ExFab contamination policy.

The following is a list of equipment that fall into the "Clean" category.

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Equipment name & Badger ID Technique Cleanliness Primary Materials Etched Process Temperature Range Chemicals Substrate Size Substrate Type Maximum Load
Wet Bench Decontamination
wbdecon
Clean
,
,
Wet Bench Resist Strip
wbresstrip-1
Clean (Ge), Semiclean, Flexible
20 °C - 60 °C
,
,
,
,
,
,
25 4 inch wafers

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