Clean
The "Clean" cleanliness group is part of the SNF/ExFab contamination policy.
The following is a list of equipment that fall into the "Clean" category.
| Equipment name & Badger ID | Training Required & Charges | Cleanliness | Location | Notes |
|---|---|---|---|---|
|
Wet Bench Decontamination wbdecon |
Wet Bench Decontamination Training | Clean | SNF Cleanroom Paul G Allen L107 |
KOH or wafersaw or post-cmp decontamination |
|
Wet Bench Resist Strip wbresstrip-1 |
Wet Bench Resist Strip | Clean (Ge), Semiclean, Flexible | SNF Cleanroom Paul G Allen L107 |
Wet Resist Removal: SRS-100 or PRS1000 |
Pages
| Equipment name & Badger ID | Technique | Cleanliness | Primary Materials Etched | Process Temperature Range | Chemicals | Substrate Size | Substrate Type | Maximum Load |
|---|---|---|---|---|---|---|---|---|
|
Wet Bench Decontamination wbdecon |
Clean |
, , |
||||||
|
Wet Bench Resist Strip wbresstrip-1 |
Clean (Ge), Semiclean, Flexible |
20 °C - 60 °C
|
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25 4 inch wafers |
