Skip to content
Skip to navigation
Stanford Nanofabrication Facility
Lab User Guide
Navigation menu
Guide Main Menu
SNF Home
Guide Home
Guide Home Overview
Lab Spaces
Techniques
Overview
Processing Techniques
Projects
Nano Nuggets
Processes
Runsheets
Safety & Policies
Overview
Lab Manual
1.0 General Policies
2.0 Getting Around
3.0 Safety for All
4.0 General Chemical Safety
5.0 Appendices
Safety Training
SDS
Mavericks (ExFab Room 155) Policies
Prescription Safety Glasses
Training
Overview/Equipment List
Training Calendar
Training Course Online
Training Shadowing Form
Training Videos
All Litho class
Materials
Overview
Chemicals & Materials
Cleanliness Groups
New Process or Material Requests (PROM)
Chemicals List
Materials List
Gases List
Useful Links
Run NEMO (login required)
NEMO User Guide
Events
External Links
Wafer Dopant and Resistivity Specs
Face shield cleaning using steamer
Tool Monitoring
People
Staff List
For Emergencies
Technical Liaisons
Consultants
Equipment
Equipment Name Table
Characterization Equipment
CVD Equipment
Doping Equipment
Dry Etch Equipment
Metallization Equipment
Oxidation and Annealing Equipment
Photolithography Equipment
Wet Bench Equipment
Related Links
Function and Method(s):
Atomic Layer Deposition (ALD)
Equipment Used:
Fiji 1 ALD (fiji1)
Fiji 2 ALD (fiji2)
ALD Dielectric Electrical Characterization- Final Report
ALD Dielectric Electrical Characterization- Final Report
PDF File:
ALD Dielectric Electrical Characterization- Final Report
This should be displaying the file at https://snfguide.stanford.edu/sites/default/files/sections/diplayfiles/ald_dielectric_electrical_characterization.pdf inline. If it's not, look to see if your browser is set to automatically download pdf filess
Materials
Alumina (Al
2
O
3
)
Hafnia (HfO
2
)
Thursday, August 10, 2023
