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Sputtering Deposition of Metal and Dielectric Films

Project Type: 
E241
Date: 
June 2011
Areas of Interest: 
Low temp deposition of Ti, SiO2 and W
Report(s): 
Sputtering Deposition of Metal and Dielectric Films- Final Report
Processing Technique (former Function and Method): 
Sputtering
Researchers and (Mentors): 
Vijay Parameshwaran, (Ed Myers)
Presentation(s): 
Sputtering deposition of metals and dielectrics- Final Presentation