Skip to content Skip to navigation

A Low Temperature, Low Stress SiGe Process

Project Type: 
E241
Date: 
March 2011
Areas of Interest: 
Low Temp, Low Stress SiGe Process
Report(s): 
A Low Temperature, Low Stress SiGe Process- Final Report
Processing Technique (former Function and Method): 
Low Pressure (LP) CVD
Researchers and (Mentors): 
Scott Lee and Chen Chen