Etching Block Copolymer Directed Self-Assembly Holes
Areas of Interest:
Directed Self Assembly, Nanoscale patterning
Processing Technique (former Function and Method):
Researchers and (Mentors):
Maryanne Tung, Hansen Qiao, (Michelle Rincon), (Archana Kumar), (Jim Kruger)
List of Important Equipment:
In this standard operating procedure (SOP), we propose a recipe for DSA with 70:30 PS-b-PMMA.
Here, we describe our strategy for inspecting the cross-section of features transferred from the BCP into an underlying hard material (e.g. SiO2, Si).