SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
The Versaline LL-ICP Metal Etcher was acquired in late 2011 for precision metal etching on a flexible range of substrate types.
Single wafer; Default 4" config; Can be converted to 6" config; pieces need to be attached to carrier wafer; Restrictions: Can not etch metals or metal oxides with no volatile by-products (shorting & arcing issues)