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Function and Method(s):
Atomic Layer Deposition (ALD)
Equipment Used:
Fiji 3 ALD (fiji3)
Developing a standard recipe of thermal ALD Tantalum Pentoxide(Ta2O5) film- Final Presentation
Developing a standard recipe of thermal ALD Tantalum Pentoxide(Ta2O5) film- Final Report
PDF File:
Developing a standard recipe of thermal ALD Tantalum Pentoxide(Ta2O5) film- Final Report
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Materials
Tantalum Pentoxide (Ta
2
O
5
)
Thursday, August 10, 2023
