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A Study of Analytical and Empirical Resist Reflow in the Literature

Graph of predicted vs actual resist profiles
Experimental and simulated resist profiles as a function of time, at 120 C.

Dating back to the '80s, there have been numerous  mentions of photoresist reflow being used in device fabrication.  Surprisingly, reports of systematic empirical characterizations or analytical modelling of the reflow process have been relatively scarce.  In this article, we summarize the main findings in the literature leading up to our own study, directly quoting published figures to capture the most information.  In planning our splits, we aimed to generate data that would complement what has already been studied.

Materials
Wednesday, April 14, 2021