EPI (CVD), Low Pressure (LP) CVD, Hydrogen (H2) Annealing, Doping, Plasma Enhanced (PE) CVD |
AMAT Centurion Epitaxial System epi2 |
Deposit epitaxial and polycrystalline silicon, germanium and silicon-germanium films.
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Clean |
SNF Cleanroom Paul G Allen L107 |
Plasma Enhanced (PE) CVD |
PlasmaTherm Shuttlelock PECVD System ccp-dep |
The Plasma-Therm Shuttlelock PECVD (CCP-Dep) system is used for depositing low-stress silicon nitride, silicon dioxide, amorphous and silicon carbide, and silicon oxynitride layers on 4 inch wafers.
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All |
SNF Cleanroom Paul G Allen L107 |
Plasma Enhanced (PE) CVD |
PlasmaTherm Versaline HDP CVD System hdpcvd |
High Density Plasma Enhanced Chemical Vapor Deposition (HD PECVD) system is used to deposit silicon dioxide, silicon nitride and amorphous silicon.
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All |
SNF Cleanroom Paul G Allen L107 |