Poly-Si Deposition on Mo/Si substrate in ThermcoPoly2 (LPCVD)
PROM Request Title:
Poly-Si Deposition on Mo/Si substrate in ThermcoPoly2 (LPCVD)
PROM Request Summary:
Deposition of poly-Si on Mo/Si substrate in ThermocoPoly2 requires approval to demonstrate low vapor pressure of Mo at process conditions.
PROM Decision:
Approved. Any changes to documented request will require re-evaluation by committee.
Link to PROM Request and supporting documentation: