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Deposit LPCVD nitride on 10 nm ALD Al2O3

PROM Request Title: 
Deposit LPCVD nitride on 10 nm ALD Al2O3
PROM Request Summary: 
Procedure to go from Fiji1 (semiclean) to LPCVD furnace (clean).
PROM Date: 
03/21/2017
PROM Decision: 
Request approved.