We are using the grouping of Patterning to describe ways of creating shapes of materials on a sample that don't easily fall into one of our other categories.
No equipment matches all of the filter criteria you have set above. Especially make sure only Main Purpose OnlyORFull Purpose has something in it other than "- Any -"—they do not play well with each other!
We propose to develop a robust process for undercutting Si from structures using SF6 in the PT-DSE. Previous works have released LN nanomechanical resonators using XeF2 in the Xactix, but extreme sensitivity to chamber conditions and drastic differences in the silicon and silicon oxide etch rates led to unreliable etch rates and a low yield on final devices.
The nanoscribe can be used to create template structures for particle self assembly, and details about inverse opal BCC and FCC structures are described.
Highly monodisperse 4 um PMMA spherical particles were assembled in PDMS wells on either a silicon substrate or a glass coverslip. In order to quantify the order of one assembly compared to another, a radial distribution function (RDF) is used.
Adhesion between metals and polymers are rarely explored. For each type of polymer and metal combination, a customized adhesion method needs to be established- here is a case study for PDMS and Gold adhesion.
Lift-off procedures have been a tool researchers have been using for decades to transfer patterns when etching them just wouldn't do. In fact, the whole technique of lift-off was created...