Deposited Nitride (PECVD)

Silicon nitride is deposited in the PECVD system by the reaction between silane (5% Silane in He) and nitrogen. In the HDPCVD system, 100% silane and N2 are the reactants to produce silicon nitride film.

Equipment name & Badger ID	Location	Link to Training
PlasmaTherm Shuttlelock PECVD System ccp-dep	SNF Cleanroom Paul G Allen L107	PlasmaTherm Shuttlelock PECVD System Training
PlasmaTherm Versaline HDP CVD System hdpcvd	SNF Cleanroom Paul G Allen L107	PlasmaTherm Versaline HDP CVD System Training
STS Plasma Enhanced CVD sts	SNF Cleanroom Paul G Allen L107	STS Plasma Enhanced CVD Training

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Techniques

Deposited Nitride (PECVD)