Equipment name & NEMO ID | Technique | Cleanliness | Minimum Resolution | Exposure Wavelength | Resist | Developer | Process Temperature Range | Chemicals | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|---|
Ex Fab Develop Wet Bench wbexfab_dev |
Flexible | ||||||||||
Ex Fab Solvent Wet Bench wbexfab_solv |
Flexible | ||||||||||
Finetech Lambda flipchipbonder |
Flexible |
°C - 400 °C
|
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1 | |||||||
Headway 3 Manual Resist Spinner headway3 |
All | 1 piece or wafer | |||||||||
Heidelberg MLA 150 heidelberg |
All |
|
405 nm |
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1 | ||||||
HMDS Vapor Prime Oven, YES2 yes2 |
All |
150 ºC
|
25 | ||||||||
Keyence Digital Microscope VHX-6000 keyence |
All |
, , , , , , , , |
|||||||||
Nanoscribe Photonics GT nanoscribe |
Flexible | 1 | |||||||||
Profilometer Alphastep 500 alphastep |
Flexible |
, , , , , , , , |
1 | ||||||||
Profilometer AlphaStep D-300 alphastep2 |
Flexible |
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1 |