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nSiL: L104 Stinson

New Badger Area created for occupancy limits.

mr_equipment

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Equipment name & Badger ID Technique Cleanliness Material Thickness Range Minimum Resolution Exposure Wavelength Resist Developer Objective Separation Process Temperature Range Substrate Size Substrate Type Maximum Load
Alphastep 500 Profilometer
alphastep
Flexible
,
,
,
,
,
,
,
,
1
Digital Instruments AFM Nanoscope Dimension 3000
afm2
All
Ex Fab Develop Wet Bench
wbexfab_dev
Flexible
Ex Fab Solvent Wet Bench
wbexfab_solv
Flexible
Finetech Lambda
flipchipbonder
Flexible
°C - 400 °C
,
,
,
,
,
1
Headway 3 Manual Resist Spinner
headway3
Flexible
1 piece or wafer
Heidelberg MLA 150
heidelberg
All
405 nm
,
,
,
,
,
,
,
,
,
,
,
,
1
HMDS Vapor Prime Oven, YES2
yes2
All
150 ºC
25
Keyence Digital Microscope VHX-6000
keyence
All
,
,
,
,
,
,
,
,
Micro Mist Coater PDR-04
micromist-coater
Flexible
Nanoscribe Photonics GT
nanoscribe
All
1