SNF is open under New Normal Rules. ANY shadowing must be coordinated with SNF staff first.
Equipment name & Badger ID | Technique | Cleanliness | Material Thickness Range | Minimum Resolution | Exposure Wavelength | Resist | Developer | Objective Separation | Process Temperature Range | Chemicals | Substrate Size | Substrate Type | Maximum Load |
---|---|---|---|---|---|---|---|---|---|---|---|---|---|
Alphastep 500 Profilometer alphastep |
Flexible |
|
|
|
|
, , , , , , , , |
1 | ||||||
Ex Fab Develop Wet Bench wbexfab_dev |
Flexible |
|
|
|
|
||||||||
Ex Fab Solvent Wet Bench wbexfab_solv |
Flexible |
|
|
|
|
||||||||
Finetech Lambda flipchipbonder |
Flexible |
|
|
|
°C - 400 °C
|
, , , , , |
1 | ||||||
Headway 3 Manual Resist Spinner headway3 |
Flexible |
|
|
|
|
1 piece or wafer | |||||||
Heidelberg MLA 150 heidelberg |
All |
|
|
405 nm |
|
|
, , , , , , , , , , , , |
1 | |||||
HMDS Vapor Prime Oven, YES2 yes2 |
All |
|
|
|
150 ºC
|
25 | |||||||
Keyence Digital Microscope VHX-6000 keyence |
All |
|
|
|
|
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|||||||
Micro Mist Coater PDR-04 micromist-coater |
Flexible |
|
|
|
|
||||||||
Nanoscribe Photonics GT nanoscribe |
All |
|
|
|
|
1 |