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Stanford Nanofabrication Facility
SNF is open under
New Normal Rules
. ANY shadowing must be coordinated with SNF staff first.
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Tungsten Silicide
Chemical Formula:
WSi
2
Equipment Tabs
Deposition Equipment
Equipment name or Badger ID
Partial words okay.
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Etch Equipment
Equipment name or Badger ID
Partial words okay.
Etch Equipment
Equipment name & Badger ID
Cleanliness
Location
Primary Materials Etched
Other Materials Etched
AMAT P5000 Etcher
p5000etch
Clean
Clean (Ge)
Semiclean
SNF Cleanroom Paul G Allen L107
Si based materials
Si
SiGe
SiN
SiO
2
SiON
Poly Silicon
C
C
C
dimethylpolysiloxane
poly(p-xylylene)
SiC
Ti
Various C-based
W
WSi
2
PI
Resist
Ti Tungsten
