Skip to content Skip to navigation

Silane

Chemical Formula:

SiH₄

Gases Equipment Tabs

Etch Equipment Table

No equipment matches all of the filter criteria you have set above.

Anneal/Oxidation Equipment Table

Deposition Equipment
Equipment name & Badger ID	Cleanliness	Location	Material Thickness Range	Approved Materials supplied by Lab
Aix-ccs aix-ccs	Clean (MOCVD)	SNF MOCVD Paul G Allen 213XA	0 - 5 μm	AlGaN AlN GaN InAlN InGaAlN InGaN InN
Aix200 aix200	Flexible	SNF MOCVD Paul G Allen 213XA	0 - 5 μm	AlAs AlGaAs GaAs GaP GaPN III-V materials InAs InGaAs InGaAsN
Epi2 epi2	Clean	SNF Cleanroom Paul G Allen L107	50 Å - 3 μm	Ge Si Si SiGe
PlasmaTherm Versaline HDP CVD System hdpcvd	All	SNF Cleanroom Paul G Allen L107	500 Å - 4 μm
ThermcoLTO thermcoLTO	Flexible	SNF Cleanroom Paul G Allen L107	100 Å - 3 μm	SiO₂
ThermcoPoly1 thermcopoly1	Clean	SNF Cleanroom Paul G Allen L107	100 Å - 3 μm	Ge Si Si SiGe
ThermcoPoly2 thermcopoly2	Flexible	SNF Cleanroom Paul G Allen L107	100 Å - 3 μm	Ge Si Si SiGe
TylanBPSG tylanbpsg	Clean Semiclean	SNF Cleanroom Paul G Allen L107	100 Å - 3 μm	SiO₂