Equipment name & Badger ID![]() |
Technique | Cleanliness | Material Thickness Range | Minimum Resolution | Exposure Wavelength | Mask Size | Max Exposure Area | Resist | Developer | Objective Separation | Process Temperature Range | Chemicals | Substrate Size | Substrate Type | Maximum Load |
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110°C Oven oven110 |
All |
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110 ºC
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90°C Oven oven90 |
All |
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90 ºC
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ASML PAS 5500/60 i-line Stepper asml |
All |
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365 nm | 5 inch |
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Blue M Oven bluem |
Flexible |
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0 °C - 430 °C
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EV Group Contact Aligner evalign |
All |
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350 - 450 nm | 5 inch, 7 inch | 5 inch mask = 4 inch, 7 inch mask = 6 inch |
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one piece or wafer | |||||
EVG 101 Spray Coater evgspraycoat |
All |
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1 | ||||||||
Headway Manual Resist Spinner headway2 |
All |
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one piece or wafer | ||||||||
HMDS Vapor Prime Oven, YES yes |
All |
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150 ºC
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Karl Suss MA-6 Contact Aligner 1 karlsuss |
All |
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365 nm | 4 inch, 5 inch, 7 inch | 5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch |
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Karl Suss MA-6 Contact Aligner 2 karlsuss2 |
All |
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365 nm or 405 nm | 4 inch, 5 inch, 7 inch | 5 inch mask = 4 inch, 7 inch mask = 6 inch, 4 inch mask = 3 inch |
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Laurell Manual Resist Spinner laurell-R |
All |
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Lithography Solvent Bench lithosolv |
Flexible |
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Mask Scrubber masksrub |
All |
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5 inch |
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SVG Develop Track 1 svgdev |
All |
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25 4 inch wafers | ||||||||
SVG Develop Track 2 svgdev2 |
All |
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25 4 inch wafers | ||||||||
SVG Resist Coat Track 1 svgcoat |
All |
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25 4 inch wafers | ||||||||
SVG Resist Coat Track 2 svgcoat2 |
All |
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25 4 inch wafers | ||||||||
Ultraviolet Photoresist Cure uvcure |
All |
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254 nm |
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White Oven white-oven |
Flexible |
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0 °C - 200 °C
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