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Standard Clean 2

Preferred Short Name: 
SC2
Chemical Formula: 
H2O:H2O2:HCl (5:1:1)
Full Chemical Name (for In-Use Hazardous Chemicals card): 
DI water, Hydrogen peroxide, Hydrochloric Acid

SC2 is usually used as a follow up step to an SC1 clean. This step in the clean sequence targets metal ion surface contamination and is required before going into high temperature gate oxide growth.

Partial words okay.
Equipment name & Badger ID Training Required & Chargessort descending Cleanliness Location Chemicals Notes
Wet Bench Clean 2
wbclean-2
Wet Bench Clean 1 and 2 Training
2.25 hours
SNF Cleanroom Paul G Allen L107

No resist allowed. Resist should have been removed at the wbclean_res-piranha

Wet Bench Clean 1
wbclean-1
Wet Bench Clean 1 and 2 Training
2.25 hours
SNF Cleanroom Paul G Allen L107

No resist allowed. Resist should have been removed at the wbclean_res-piranha.

Wet Bench Flexcorr 1
wbflexcorr-1
Wet Bench Flexcorr 1and2 and 3and4 Training
2.25 hours
SNF Cleanroom Paul G Allen L107

Manual wet etching of non-standard materials. Hot plate available. GaAs allowed in personal labware only.

Wet Bench Decontamination
wbdecon
Wet Bench Decontamination Training SNF Cleanroom Paul G Allen L107

KOH or wafersaw or post-cmp decontamination

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