BiSbTe etch in Ox-35

PROM Request Title:

PROM Request Summary:

Contamination evaluation plan documented to introduce Bi into Ox-35 etcher.

PROM Date:

02/03/2020

PROM Decision:

PROM Request is approved with no special requirements around processing. BiSbTe does contaminate the etch chamber, but contaminants can be removed with the cleaning procedures documented. All users of the Ox-35 who will go to the MOCVD equipment a...

Link to PROM Request and supporting documentation:

BiSbTe etch in Ox-35

Equipment List:

Oxford III-V etcher (Ox-35)